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Laser ablation of polymers was reported first in 1982 by R.Srinivasan et al and Y. Kawamura et al and has been considered as promising method for dry etching of
polymers. Very soon the first discussions about the mechanism started, i.e. whether the ablation mechanism is thermal, photothermal or photochemical.
Two approaches that can give insights into this complicated processes are single pulse and/or time-resolved methods and the modification or design of polymers for ablation. |
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